Built for failure analysis and material engineering research, the OLS5100 laser microscope combines exceptional measurement accuracy and optical performance with smart tools that make the microscope easy to use. Precisely measure shape and surface roughness at the submicron level quickly and efficiently to simplify your workflow with data you can trust.
Laser Microscope for Material Analysis
Smart Workflow, Faster Experiments
Built for failure analysis and material engineering research, the OLS5100 laser microscope combines exceptional measurement accuracy and optical performance with smart tools that make the microscope easy to use. Precisely measure shape and surface roughness at the submicron level quickly and efficiently to simplify your workflow with data you can trust.
Guaranteed Measurement Accuracy
LEXT microscope objectives deliver highly accurate measurement data. Paired with the Smart Lens Advisor, you can acquire accurate data you can be confident in.
Guaranteed measurement accuracy
10x to 100x objectives that reduce aberrations at 405 nm to capture the correct shape of your sample throughout the entire field of view
Smart Lens Advisor helps you choose the right objective lens for your roughness measurement
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| Conventional lenses have difficulty making accurate measurements in peripheral areas. | Dedicated LEXT objectives accurately measure peripheral areas. |
Easy Laser Scanning Microscopy
Using the microscope is easy for novice and experienced users thanks to thoughtfully designed software.
Acquire accurate data easily—put your sample on the stage and press the start button
Measurement performance guarantee tailored to your operating environment*.
The information, including guaranteed accuracy, on this web page is based on conditions set by Evident
Easier Material Engineering and Failure Analysis Experiments
The Smart Experiment Manager makes your submicron 3D observation and failure analysis experiment workflows simpler by automating previously time-consuming tasks.
Automate your analysis workflow with macro functions
Measurement data is easy to organize
Autopopulates data to your experiment plan matrix, reducing the chance of input errors
Measurement results are displayed in a list, enabling a pass/fail judgment at a glance.
Service and Support You Can Trust
From calibration to training, we offer a broad portfolio of services to help you maintain optimal device performance. Evident service contracts are:
Straightforward—so you can focus on the core of your business
Efficient—we can schedule preventative maintenance, including calibrations, on your behalf
Cost-effective—providing you savings throughout the life of the contract
| Model | OLS5100-SAF | OLS5100-SMF | OLS5100-LAF | OLS5100-EAF | |
|---|---|---|---|---|---|
| Total magnification | 54x–17,280x | ||||
| Field of view | 16 μm–5,120 μm | ||||
| Measurement principle | Optical system |
Reflection-type confocal laser scanning laser microscope Reflection-type confocal laser scanning laser-DIC microscope Color Color-DIC | |||
| Measurement principle | Light receiving element |
Laser: Photomultiplier (2 channels) Color: CMOS color camera | |||
| Height measurement | Display resolution | 0.5 nm | |||
| Height measurement | Dynamic range | 16 bits | |||
| Height measurement | Repeatability σn-1*1 *2 *5 | 5X: 0.45 μm, 10X: 0.1 μm, 20X: 0.03 μm, 50X : 0.012 μm, 100X : 0.012 μm | |||
| Height measurement | Accuracy *1 *3 *5 | 0.15+L/100 μm (L:Measuring length[μm]) | |||
| Height measurement | Accuracy for stitched image *1 *3 *5 | 10X: 5.0+L/100 μm, 20X or higher: 1.0+L/100 μm (L: Stitching length [μm]) | |||
| Height measurement | Measurement noise (Sq noise) *1 *4 *5 | 1 nm (Type) | |||
| Width measurement | Display resolution | 1 nm | |||
| Width measurement | Repeatability 3σn-1*1 *2 *5 | 5X: 0.4 μm, 10X: 0.2 μm, 20X: 0.05 μm, 50X: 0.04 μm, 100X: 0.02 μm | |||
| Width measurement | Accuracy *1 *3 *5 | Measurement value +/- 1.5% | |||
| Width measurement | Accuracy for stitched image *1 *3 *5 | 10X: 24+0.5L μm, 20X: 15+0.5L μm, 50X: 9+0.5L μm, 100X: 7+0.5L μm (L: Stitching length [mm]) | |||
| Maximum number of measuring points in a single measurement | 4096 × 4096 pixels | ||||
| Maximum number of measuring points | 36-megapixels | ||||
| XY stage configuration | Length measurement module | ? | NA | NA | ? |
| XY stage configuration | Operating range | 100 × 100 mm (3.9 × 3.9 in.) Motorized | 100 × 100 mm (3.9 × 3.9 in.) Manual | 300 × 300 mm (11.8 × 11.8 in.) Motorized | 100 × 100 mm (3.9 × 3.9 in.) Motorized |
| Maximum sample height | 100 mm (3.9 × 3.9 in.) | 40 mm (1.6 in.) | 37 mm (1.5 in.) | 210 mm (8.3 in.) | |
| Laser light source | Wavelength | 405 nm | |||
| Laser light source | Maximum output | 0.95 mW | |||
| Laser light source | Laser class | Class 2 (IEC60825-1:2007, IEC60825-1:2014)*6 | |||
| Color light source | White LED | ||||
| Electrical power | 240 W | 240 W | 278 W | 240 W | |
| Mass | Microscope body | Approx. 31 kg (68.3 lb) | Approx. 32 kg (70.5 lb) | Approx. 50 kg (110.2 lb) | Approx. 43 kg (94.8 lb) |
| Mass | Control box | Approx. 12 kg (26.5 lb) | |||
*1 Guaranteed when used in constant temperature and constant-humidity environment (temperature: 20?C±1?C, humidity: 50%±10%) specified in ISO554(1976), JIS Z-8703(1983).
*2 For 20x or higher, when measured with MPLAPON LEXT series objectives.
*3 When measured with dedicated LEXT objective.
*4 Typical value when measured with MPLAPON100XLEXT objective, and may differ from the guaranteed value.
*5 Guaranteed under Evident Certificate System.
*6 OLS5100 is a Class 2 laser product. Do not stare into beam.
** The OS license of Window 10 has been certified for the microscope controller provided by Evident. Therefore, Microsoft's license terms are applied and you agree to the terms.Please refer to the following for Microsoft license terms.
https://www.microsoft.com/en-us/Useterms/Retail/Windows/10/UseTerms_Retail_Windows_10_english.htm
| Series | Model | Numerical Aperture (NA) | Working Distance (WD) (mm) |
|---|---|---|---|
| UIS2 objective lens | MPLFLN2.5X | 0.08 | 10.7 |
| MPLFLN5X | 0.15 | 20 | |
Dedicated LEXT objective lens (10X) | MPLFLN10XLEXT | 0.3 | 10.4 |
Dedicated LEXT objective lens (high-performance type) | MPLAPON20XLEXT | 0.6 | 1 |
| MPLAPON50XLEXT | 0.95 | 0.35 | |
| MPLAPON100XLEXT | 0.95 | 0.35 | |
Dedicated LEXT objective lens (long working distance type) | LMPLFLN20XLEXT | 0.45 | 6.5 |
| LMPLFLN50XLEXT | 0.6 | 5.2 | |
| LMPLFLN100XLEXT | 0.8 | 3.4 | |
| Super long working distance lens | SLMPLN20X | 0.25 | 25 |
| SLMPLN50X | 0.35 | 18 | |
| SLMPLN100X | 0.6 | 7.6 | |
| Long working distance for LCD lens | LCPLFLN20XLCD | 0.45 | 8.3-7.4 |
| LCPLFLN50XLCD | 0.7 | 3.0-2.2 | |
| LCPLFLN100XLCD | 0.85 | 1.2-0.9 |
| Standard software | OLS51-BSW | |||
|---|---|---|---|---|
| Standard software | Data acquisition app | Analysis app (simple analysis) | ||
| Motorized stage package application*1 | OLS50-S-MSP | |||
| Advanced analysis application*2 | OLS50-S-AA | |||
| Film thickness measurement application | OLS50-S-FT | |||
| Auto edge measurement application | OLS50-S-ED | |||
| Particle analysis application | OLS50-S-PA | |||
| Experimental total assist application | OLS51-S-ETA | |||
| Sphere/cylinder surface angle analysis application | OLS50-S-SA | |||
*1 Including auto-stitching data acquisition and multi-area data acquisition functions.
*2 Including Profile analysis, Difference analysis, Step-height analysis, Surface analysis, Area/volume analysis, Line roughness analysis, Area roughness analysis and Histogram analysis.
OLS5100-SAF Setup Example
OLS5100-SAF
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OLS5100-EAF
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OLS5100-SMF
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OLS5100-LAF
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